Display apparatus and method of manufacturing the same

ABSTRACT

A display apparatus includes a first pixel, a second pixel, and a third pixel which emit light of different colors from one another, a first insulating layer on a first display element of the first pixel, and a second insulating layer on the first insulating layer. The first insulating layer defines a first opening portion corresponding to the first display element, the second insulating layer defines a first opening corresponding to the first opening portion, and the first opening portion has a first extension portion which extends in a first direction and at least partially exposes the second insulating layer.

This application claims priority to Korean Patent Application No.10-2019-0143665, filed on Nov. 11, 2019, and all the benefits accruingtherefrom under 35 U.S.C. § 119, the content of which in its entirety isherein incorporated by reference.

BACKGROUND 1. Field

One or more exemplary embodiments relate to a display apparatus and amethod of manufacturing the display apparatus, and more particularly, toa display apparatus having improved color reproducibility and a simplemethod of manufacturing the display apparatus.

2. Description of Related Art

A display apparatus visually displays data. A display apparatus may beused as a display in a small-sized product such as a mobile phone, or adisplay in a large-sized product such as a television.

A display apparatus includes a plurality of pixels that emit light byreceiving electrical signals in order to externally display images. Eachof the pixels includes a display element. For example, in an organiclight-emitting display apparatus, the display element is an organiclight-emitting diode (“OLED”).

Recently, usage of display apparatuses has increased, and variousdesigns have been tried for improving the quality of displayapparatuses. In particular, as the resolution of a display apparatusincreases, research has been actively conducted in order to improvecolor reproduction of each pixel in a display apparatus.

SUMMARY

However, according to a display apparatus and a method of manufacturingthe display apparatus of the related art, the time taken for eachmanufacturing process (i.e., tack time) increases depending on the pixelarrangement.

One or more exemplary embodiments include a display apparatus which maybe manufactured by a simple manufacturing method and has improved colorreproducibility, and a method of manufacturing the display apparatus.However, the above technical features are exemplary, and the scope ofthe disclosure is not limited thereto.

Additional aspects will be set forth in part in the description whichfollows and, in part, will be apparent from the description, or may belearned by practice of the presented exemplary embodiments of thedisclosure.

According to one or more exemplary embodiments, a display apparatusincludes a first pixel, a second pixel, and a third pixel which emitlight of different colors from one another, a first insulating layer ona first display element of the first pixel and which defines a firstopening portion corresponding to the first display element, a secondinsulating layer on the first insulating layer and which defines a firstopening corresponding to the first opening portion, a first colorconversion layer disposed in the first opening and which includes firstquantum dots for converting incident light into first color light, and afirst filter layer on the first color conversion layer, where the firstopening portion has a first extension portion that extends in a firstdirection and at least partially exposes the second insulating layer.

The display apparatus may further include a second color conversionlayer which corresponds to a second display element of the second pixeland includes second quantum dots for converting the incident light intosecond color light, and a second filter layer on the second colorconversion layer. The first insulating layer may further define a secondopening portion corresponding to the second display element of thesecond pixel, the second insulating layer may further define a secondopening corresponding to the second opening portion, the second colorconversion layer may be located in the second opening, and the secondopening portion may include a second extension portion which extends ina second direction opposite to the first direction and at leastpartially exposes the second insulating layer.

The display apparatus may further include a transmission layer whichcorresponds to a third display element of the third pixel and includesscattering particles for scattering the incident light, and a thirdfilter layer on the transmission layer, where the first insulating layermay further define a third opening portion corresponding to the thirddisplay element of the third pixel, the second insulating layer mayfurther define a third opening corresponding to the third openingportion, the transmission layer may be located in the third opening, andthe third opening portion may include a third extension portion whichextends in the first direction at least partially exposes the secondinsulating layer.

The first extension portion, the second extension portion, and the thirdextension portion may have the same width in the first direction or thesecond direction.

A first emission area of the first pixel, a second emission area of thesecond pixel, and a third emission area of the third pixel may havesquare shapes in a plan view.

Extension lines which connect a center of one of the first emissionarea, the second emission area, and the third emission area to centersof the other two emission areas may cross one another in a plan view.

At least one of the first insulating layer and the second insulatinglayer may include a light-blocking material.

A surface of the second insulating layer, which is exposed by the firstextension portion, may have a hydrophobic property.

A surface of the second insulating layer, which is exposed by the firstextension portion, may be inclined.

The first insulating layer and the second insulating layer may beintegrally provided with each other.

A surface of the second insulating layer, which is exposed by the firstextension portion, may have a hydrophobic property.

A surface of the second insulating layer, which is exposed by the firstextension portion, may be inclined.

According to one or more exemplary embodiments, a method ofmanufacturing a display apparatus includes manufacturing a display unit,manufacturing a color filter unit, and bonding the display unit to thecolor filter unit, where the manufacturing of the color filter unitincludes forming a light-blocking layer on an upper substrate, forming afirst filter layer in a hole defined by the light-blocking layer,forming a second insulating layer defining a first opening on thelight-blocking layers, forming a first insulating layer defining a firstopening portion on the second insulating layer, where the first openingportion has a first extension portion which extends in a first directionand at least partially exposes the second insulating layer, and forminga first color conversion layer in the first opening, the first colorconversion layer including first quantum dots for converting incidentlight into first color light.

The method may further include processing a surface of the secondinsulating layer to have a hydrophobic property, wherein the surface maybe exposed by the first extension portion.

The method may further include processing a surface of the secondinsulating layer to be inclined, wherein the surface may be exposed bythe first extension portion.

The forming of the first insulating layer and the forming of the secondinsulating layer may be performed simultaneously.

The forming of the first insulating layer and the forming of the secondinsulating layer may be performed by using a half-tone mask.

The method may further include processing a surface of the secondinsulating layer to have a hydrophobic property, wherein the surface maybe exposed by the first extension portion.

The forming of the first color conversion layer may be performed by aninkjet printing method.

At least one of the first insulating layer and the second insulatinglayer may include a light-blocking material.

BRIEF DESCRIPTION OF THE DRAWINGS

The above and other aspects, features, and advantages of certainexemplary embodiments of the disclosure will be more apparent from thefollowing description taken in conjunction with the accompanyingdrawings, in which:

FIG. 1 is a perspective view of a display apparatus according to anexemplary embodiment;

FIG. 2 is a cross-sectional view of the display apparatus according toan exemplary embodiment;

FIG. 3 is an enlarged view showing a part of a display apparatusaccording to an exemplary embodiment;

FIG. 4 is a plan view of a display apparatus according to an exemplaryembodiment;

FIG. 5 is a cross-sectional view of a color filter unit according to anexemplary embodiment;

FIG. 6 is a cross-sectional view of a first pixel in a color filter unitaccording to an exemplary embodiment;

FIG. 7 is a cross-sectional view of a first extension in a color filterunit according to an exemplary embodiment;

FIGS. 8 and 9 are cross-sectional views of a color filter unit accordingto another exemplary embodiment;

FIG. 10 is a cross-sectional view of a display apparatus according to anexemplary embodiment; and

FIGS. 11A to 11 F are cross-sectional views illustrating processes of amethod of manufacturing a display apparatus, according to an exemplaryembodiment.

DETAILED DESCRIPTION

Reference will now be made in detail to exemplary embodiments, examplesof which are illustrated in the accompanying drawings, wherein likereference numerals refer to like elements throughout. In this regard,the present exemplary embodiments may have different forms and shouldnot be construed as being limited to the descriptions set forth herein.Accordingly, the exemplary embodiments are merely described below, byreferring to the figures, to explain aspects of the present description.As used herein, the term “and/or” includes any and all combinations ofone or more of the associated listed items. Throughout the disclosure,the expression “at least one of a, b or c” indicates only a, only b,only c, both a and b, both a and c, both b and c, all of a, b, and c, orvariations thereof.

The exemplary embodiments will be described below in more detail withreference to the accompanying drawings. Those components that are thesame or are in correspondence are rendered the same reference numeralregardless of the figure number, and redundant explanations are omitted.

While such terms as “first,” “second,” etc., may be used to describevarious components, such components are not be limited to the aboveterms. The above terms are used only to distinguish one component fromanother.

An expression used in the singular encompasses the expression of theplural, unless it has a clearly different meaning in the context.

In the present specification, it is to be understood that the terms“including,” “having,” and “comprising” are intended to indicate theexistence of the features, numbers, steps, actions, components, parts,or combinations thereof disclosed in the specification, and are notintended to preclude the possibility that one or more other features,numbers, steps, actions, components, parts, or combinations thereof mayexist or may be added.

It will be understood that when a layer, region, or component isreferred to as being “formed on” another layer, region, or component, itmay be directly or indirectly formed on the other layer, region, orcomponent. That is, for example, intervening layers, regions, orcomponents may be present.

Sizes of components in the drawings may be exaggerated for convenienceof explanation. In other words, since sizes and thicknesses ofcomponents in the drawings are arbitrarily illustrated for convenienceof explanation, the following exemplary embodiments are not limitedthereto.

When a certain exemplary embodiment may be implemented differently, aspecific process order may be performed differently from the describedorder. For example, two consecutively described processes may beperformed substantially at the same time or performed in an orderopposite to the described order.

In the specification, the phrase “A and/or B” denotes A, B, or A and B.In addition, the phrase “at least one of A and B” denotes A, B, or A andB.

In the exemplary embodiments below, when layers, areas, or elements orthe like are referred to as being “connected,” it will be understoodthat they may be directly connected or an intervening portion may bepresent between layers, areas or elements. For example, when layers,areas, or elements or the like are referred to as being “electricallyconnected,” they may be directly electrically connected, or layers,areas or elements may be indirectly electrically connected and anintervening portion may be present.

The x-axis, the y-axis and the z-axis are not limited to three axes ofthe rectangular coordinate system, and may be interpreted in a broadersense. For example, the x-axis, the y-axis, and the z-axis may beperpendicular to one another, or may represent different directions thatare not perpendicular to one another.

Hereinafter, one or more exemplary embodiments of the disclosure will bedescribed in detail with reference to accompanying drawings.

FIG. 1 is a perspective view of a display apparatus 1 according to anexemplary embodiment.

Referring to FIG. 1, the display apparatus 1 includes a display area DAand a non-display area NDA. The display area DA displays images and thenon-display area NDA does not display images. The display apparatus 1may provide images by using light emitted from the display area DA.

In FIG. 1, the display apparatus 1 includes the display area DA having asquare shape, but the invention is not limited thereto. In an exemplaryembodiment, the display area DA may have a circular shape, an ellipticalshape, or a polygonal shape such as a triangle, a quadrangle, apentagon, etc. Also, the display apparatus 1 of FIG. 1 includes a flatpanel display apparatus, but the display apparatus 1 may be implementedas various types, e.g., a flexible display apparatus, a foldable displayapparatus, a rollable display apparatus, etc.

Hereinafter, the display apparatus 1 according to an exemplaryembodiment is described as an organic light-emitting display apparatusas an example, but the display apparatus according to the invention isnot limited thereto. In another exemplary embodiment, the displayapparatus may include an inorganic light-emitting display, an inorganicelectroluminescence (“EL”) display apparatus, or a quantum dotlight-emitting display apparatus. For example, a light-emitting layer ofa display element included in the display apparatus 1 may include anorganic material, an inorganic material, quantum dots, an organicmaterial and quantum dots, an inorganic material and quantum dots, or anorganic material, an inorganic material, and quantum dots.

A plurality of pixels P may be disposed in the display area DA. In thespecification, each pixel P may denote a sub-pixel emitting light of adifferent color from the others, and each pixel P may be one of, forexample, a red (R) sub-pixel, a green (G) sub-pixel, and a blue (B)sub-pixel.

FIG. 2 is a cross-sectional view of the display apparatus 1 according toan exemplary embodiment, and FIG. 3 is an enlarged view partiallyshowing the display apparatus 1 according to an exemplary embodiment.FIG. 3 shows an enlarged view of first and second color conversionlayers 120R and 120G and a transmission layer 120B.

Referring to FIG. 2, the display apparatus 1 includes a display unit DUand a color filter unit CU facing the display unit DU. The display unitDU may include a first pixel P1, a second pixel P2, and a third pixel P3on a substrate 100. The first pixel P1, the second pixel P2, and thethird pixel P3 may emit different color light from one another on thesubstrate 100, respectively. For example, the first pixel P1 may emitred light Lr, the second pixel P2 may emit green light Lg, and the thirdpixel P3 may emit blue light Lb.

The first pixel P1, the second pixel P2, and the third pixel P3 mayinclude a first display element OLED1, a second display element OLED2,and a third display element OLED3 each including an organiclight-emitting diode OLED, respectively. In an exemplary embodiment, thefirst display element OLED1, the second display element OLED2, and thethird display element OLED3 may emit blue light. In another exemplaryembodiment, the first display element OLED1, the second display elementOLED2, and the third display element OLED3 may emit red light, greenlight, and blue light, respectively.

The color filter unit CU may include filter portions 300R, 300G, and300B. The light emitted from the first display element OLED1, the seconddisplay element OLED2, and the third display element OLED3 may bedischarged from the display apparatus 1 as the red light Lr, the greenlight Lg, and the blue light Lb after passing through the filterportions 300R, 300G, and 300B, respectively.

The filter portions 300R, 300G, and 300B may be directly on an uppersubstrate 160. The filter portions 300R, 300G, and 300B may include thefirst color conversion layer 120R and a first filter layer 110R, thesecond color conversion layer 120G and a second filter layer 110G, andthe transmission layer 120B and a third filter layer 1106, respectively,that will be described later with reference to FIG. 5.

Here, ‘directly on the upper substrate 160’ may denote that the first tothird filter layers 110R, 110G, and 1106 are directly formed on theupper substrate 160 when manufacturing the color filter unit CU. Afterthat, the display unit DU and the color filter unit CU may be bonded toeach other, while the first to third filter layers 110R, 110G, and 1106face the first pixel P1, the second pixel P2, and the third pixel P3,respectively. FIG. 2 shows that the display unit DU and the color filterunit CU are bonded to each other via an adhesive layer ADH. The adhesivelayer ADH may include, for example, an optical clear adhesive (“OCA”),but the invention is not limited thereto. In another exemplaryembodiment, the adhesive layer ADH may be omitted.

Before referring to FIG. 3, in an exemplary embodiment, the first andsecond color conversion layers 120R and 120G may include quantum dotmaterial. A core of a quantum dot may be selected from a Group II-VIcompound, a Group III-V compound, a Group IV-VI compound, a Group IVelement, a Group IV compound, and a combination thereof.

The Group II-VI compound may be selected from the group consisting of:CdSe, CdTe, ZnS, ZnSe, ZnTe, ZnO, HgS, HgSe, HgTe, MgSe, MgS, and abinary compound selected from a group formed by mixtures thereof; AgInS,CuInS, CdSeS, CdSeTe, CdSTe, ZnSeS, ZnSeTe, ZnSTe, HgSeS, HgSeTe, HgSTe,CdZnS, CdZnSe, CdZnTe, CdHgS, CdHgSe, CdHgTe, HgZnS, HgZnSe, HgZnTe,MgZnSe, MgZnS, and a ternary compound selected from a group formed bymixtures thereof; and HgZnTeS, CdZnSeS, CdZnSeTe, CdZnSTe, CdHgSeS,CdHgSeTe, CdHgSTe, HgZnSeS, HgZnSeTe, HgZnSTe, and a quaternary compoundselected from a group formed by mixtures thereof.

The Group III-V compound may be selected from the group consisting of:GaN, GaP, GaAs, GaSb, AIN, AIP, AIAs, AlSb, InN, InP, InAs, InSb and abinary compound selected from a group formed by mixtures thereof; GaNP,GaNAs, GaNSb, GaPAs, GaPSb, AINP, AINAs, AINSb, AIPAs, ALPSb, InGaP,InNAs, InNP, InNAs, InNSb, InPAs, InPSb, GaAINP, and a ternary compoundselected from a group formed by mixtures thereof; and GaAINAs, GaAINSb,GaAIPAs, GaAIPSb, GaInNP, GaInNAs, GaInNSb, GaInPAs, GaInPSb, InAINP,InAINAs, InAINSb, InAIPAs, InAIPSb, and a quaternary compound selectedfrom a group formed by mixtures thereof.

The Group IV-VI compound may be selected from the group consisting of:SnS, SnSe, SnTe, PbS, PbSe, PbTe, and a binary compound selected from agroup formed by mixtures thereof; SnSeS, SnSeTe, SnSTe, PbSeS, PbSeTe,PbSTe, SnPbS, SnPbSe, SnPbTe, and a ternary compound selected from agroup formed by mixtures thereof; and SnPbSSe, SnPbSeTe, SnPbSTe, and aquaternary compound selected from a group formed by mixtures thereof.The Group IV element may be selected from the group consisting of Si,Ge, and mixtures thereof. The Group IV compound may include a binarycompound selected from the group consisting of SiC, SiGe, and mixturesthereof.

Here, the binary compound, the ternary compound, or the quaternarycompound may be present in the particles in a uniform concentration, ormay be present in the same particle with partially differentconcentration distributions. Also, the quantum dot may have a core/shellstructure, in which one quantum dot surrounds another quantum dot. Aninterface between the core and the shell may have a concentrationgradient in which a concentration of an element in the shell decreasestowards a center of core.

In some exemplary embodiments, the quantum dot may have the core-shellstructure including a core having a nano-crystal described above and ashell surrounding the core. The shell of the quantum dot may act as aprotective layer for preventing chemical modification of the core andmaintaining semiconductor characteristics and/or a charging layer forapplying an electrophoretic characteristic to the quantum dot. The shellmay have a single-layered structure or a multi-layered structure. Aninterface between the core and the shell may have a concentrationgradient in which a concentration of an element in the shell decreasestowards a center of the quantum dot. The shell of the quantum dot mayinclude oxide of a metal or non-metal material, a semiconductorcompound, or a combination thereof.

For example, the oxide of the metal or non-metal material may include,but is not limited to, a binary compound such as SiO₂, Al₂O₃, TiO₂, ZnO,MnO, Mn₂O₃, Mn₃O₄, CuO, FeO, Fe₂O₃, Fe₃O₄, CoO, Co₃O₄, NiO, etc., or aternary compound such as MgAl₂O₄, CoFe₂O₄, NiFe₂O₄, CoMn₂O₄, etc.

The semiconductor compound may include CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe,ZnSeS, ZnTeS, GaAs, GaP, GaSb, HgS, HgSe, HgTe, InAs, InP, InGaP, InSb,AlAs, AIP, AlSb, etc., but is not limited thereto.

The quantum dot may have a full width of half maximum (“FWHM”) of thelight emitting wavelength spectrum of about 45 nanometers (nm) or less,for example, about 40 nm or less, in particular, about 30 nm or less,and may improve color purity or color reproduction within the aboverange. Also, the light emitted from the quantum dot is omni-directional,and thus, an optical viewing angle may be increased.

The quantum dot may have any shape provided that the shape is generallyin the field, and in particular, may be a spherical, pyramidal,multi-arm, or a cubic nanoparticle, or may be a nanotube, nanowire,nanofiber, or nanoplate particle, etc.

The quantum dot may adjust a color of emitting light according to aparticle size thereof, and accordingly the quantum dot may emit variouscolor light, e.g., blue light, red light, green light, etc.

Referring to FIG. 3, the first color conversion layer 120R converts blueincident light Lib into first color light Lr (e.g., red light Lr). Thefirst color conversion layer 120R may include a first photosensitivepolymer 123R in which first quantum dots 121R and first scatteringparticles 122R are dispersed.

The first quantum dots 121R are excited by the blue incident light Liband may isotropically emit the first color light Lr having a longerwavelength than that of the blue light. The first photosensitive polymer123R may include an organic material transmitting light. The firstscattering particles 122R scatter the blue incident light Lib that isnot absorbed by the first quantum dots 121R to make more first quantumdots 121R excited, and thus may increase a color conversion ratio of thefirst color conversion layer 120R. The first scattering particles 122Rmay include, for example, titanium oxide (TiO2) or metal particles.

The second color conversion layer 120G converts the blue incident lightLib into the second color light Lg (e.g., green light Lg). The secondcolor conversion layer 120G may include a second photosensitive polymer123G in which second quantum dots 121G and second scattering particles122G are dispersed.

The second quantum dots 121G are excited by the blue incident light Liband may isotropically emit the second color light Lg having a longerwavelength than that of the blue light. The second photosensitivepolymer 123G includes an organic material transmitting light and mayinclude the same material as that of the first photosensitive polymer123R. The second scattering particles 122G scatter the blue incidentlight Lib that is not absorbed by the second quantum dots 121G to makemore second quantum dots 121G excited, and thus may increase a colorconversion ratio of the second color conversion layer 120G. The secondscattering particles 122G may include, for example, titanium oxide(TiO₂) or metal particles, and may include the same material as that ofthe first scattering particles 122R.

The transmission layer 120B transmits the blue incident light Lib andemits the blue light Lb towards the upper substrate 160. Thetransmission layer 120B may include a third photosensitive polymer 123Bin which third scattering particles 122B are dispersed. The thirdphotosensitive polymer 123B may include, for example, an organicmaterial transmitting light, such as a silicon resin, an epoxy resin,etc., and may include the same material as those of the first and secondphotosensitive polymers 123R and 123G. The third scattering particles122B may scatter and emit the blue incident light Lib and may includethe same material as those of the first and second scattering particles122R and 122G.

FIGS. 4 and 5 are a plan view and a cross-sectional view, respectively,partially showing a display apparatus according to an exemplaryembodiment.

FIGS. 4 and 5 show a plan view and a cross-sectional view of the colorfilter unit CU, respectively, according to an exemplary embodiment, andFIG. 5 corresponds to a cross-section of the color filter unit CU takenalong line B-B′ of FIG. 4.

Referring to FIGS. 4 and 5, the display apparatus according to theexemplary embodiment includes the first pixel P1, the second pixel P2,and the third pixel P3 emitting different color lights from one another.In an exemplary embodiment, the first to third pixels P1, P2, and P3 mayeach include a display element such as an organic light-emitting diodeOLED. Each of the first to third pixels P1, P2, and P3 may emit, forexample, red light, green light, blue light, or white light through theorganic light-emitting diode OLED.

As described above with reference to FIG. 2, the display apparatus 1includes the color filter unit CU on the display unit DU. The colorfilter unit CU may include the upper substrate 160, a first insulatinglayer 150, a second insulating layer 140, a light-blocking layer 130,the first to third filter layers 110R, 110G, and 110B, the first andsecond color conversion layers 120R and 120G, and the transmission layer120B.

In FIG. 5, for convenience of description, it is described that variouslayers are stacked on the upper substrate 160 in a +Z direction, but thecolor filter unit CU according to the exemplary embodiment may be turnedupside down to be attached to the display unit DU as shown in FIG. 10.Therefore, the layers will be described in a stacked order on the uppersubstrate 160.

In addition, it is assumed that the display apparatus according to theexemplary embodiment emits blue light via the organic light-emittingdiode OLED, and thus, the transmission layer 120B rather than a colorconversion layer may be disposed on the third filter layer 110B.

The upper substrate 160 may include a glass material, a ceramicmaterial, a metal material, or a flexible or bendable material. When theupper substrate 160 is flexible or bendable, the upper substrate 160 mayinclude a polymer resin such as a polyethersulfone, polyacrylate,polyetherimide, polyethylene naphthalate, polyethylene terephthalate,polyphynylene sulfide, polyarylate, polyimide, polycarbonate, orcellulose acetate propionate. The upper substrate 160 may have asingle-layered or a multi-layered structure of the above material, andthe multi-layered structure may further include an inorganic layer. Insome exemplary embodiments, the upper substrate 160 may have a structureincluding an order of an organic material/inorganic material/organicmaterial.

The light-blocking layer 130 and the first to third filter layers 110R,110G, and 110B may be on one surface of the upper substrate 160.

The light-blocking layer 130 may be disposed among the first to thirdfilter layers 110R, 110G, and 110B to correspond to a non-emitting areaNEA (see FIG. 10). The light-blocking layer 130 may include a blackmatrix for improving color sharpness and contrast. The light-blockinglayer 130 may include at least one selected from black pigment, blackdye, and black particles. In some exemplary embodiments, thelight-blocking layer 130 may include a material such as Cr or CrO_(X),Cr/CrO_(X), Cr/CrO_(X)/CrN_(Y), a resin (e.g., carbon pigment, RGBmixture pigment), graphite, non-Cr based material, etc.

The first to third filter layers 110R, 110G, and 110B may include a redcolor filter, a green color filter, and a blue color filter,respectively. The light passing through the first to third filter layers110R, 110G, and 110B may have an improved color reproducibility of red,green, and blue colors.

The second insulating layer 140 may define first to third openings 141R,141G, and 141B exposing the first to third filter layers 110R, 110G, and110B, respectively. The second insulating layer 140 may include, forexample, an organic material. In an exemplary embodiment, the secondinsulating layer 140 may include a light-blocking material to functionas a light-blocking layer. The light-blocking material may include, forexample, at least one selected from black pigment, black dye, blackparticles, and metal particles.

The first and second color conversion layers 120R and 120G and thetransmission layer 120B may be disposed in the first to third openings141R, 141G, and 141B, respectively. The first and second colorconversion layers 120R and 120G and the transmission layer 120B may havethe structure of FIG. 3.

The first insulating layer 150 may define first to third openingportions 151R, 151G, and 151B exposing the first and second colorconversion layers 120R and 120G and the transmission layer 120B,respectively. The first insulating layer 150 may include, for example,an organic material. In some cases, the first insulating layer 150 mayinclude at least one selected from black pigment, black dye, blackparticles, and metal particles to function as a light-blocking layer.

The first to third pixels P1, P2, and P3 may include the first andsecond color conversion layers 120R and 120G and the transmission layer120B, respectively, and may further include the first to third filterlayers 110R, 110G, and 110B, respectively, (see dotted portions of FIG.4) although not shown in the plan view.

The first opening portion 151 R has a first extension portion 152Rextending in a first direction (i.e., +Y direction in FIGS. 4 and 6) andat least partially exposing the second insulating layer 140. In anexemplary embodiment, a width W of the first extension portion 152R inthe first direction (+Y direction) may be equal to or greater than twicea width of the first opening 141R in the first direction (+Y direction).However, the invention is not limited to the above example.

Although the first pixel P1 is described above, the second pixel P2 andthe third pixel P3 may have the same structures as that of the firstpixel P1. However, the second opening portion 151G of the second pixelP2 has a second extension portion 152G extending in a second direction(i.e., −Y direction in FIG. 4, a direction opposite to the firstdirection) and at least partially exposing the second insulating layer140. In an exemplary embodiment, a width of the second extension portion152G in the second direction (−Y direction) may be equal to or greaterthan twice a width of the second opening 141G in the second direction(−Y direction). However, the invention is not limited to the aboveexample.

The first extension portion 152R, the second extension portion 152G, andthe third extension portion 152B may have the same width.

A region in the first filter layer 110R, through which the light emittedfrom an emission layer of the display unit DU passes after passingthrough the first color conversion layer 120R, is referred to as a firstemission area EA1 of the first pixel P1. The first emission area EA1 hasan area that is equal to or less than that of the first filter layer110R. The above structure may be also applied to the second pixel P2 andthe third pixel P3, as well as the first pixel P1.

Referring to FIG. 4, the first emission area EA1 in the first pixel P1,a second emission area EA2 in the second pixel P2, and a third emissionarea EA3 of the third pixel P3 may each have a square shape. When theemission area has a square shape, the amount of light that isineffective at opposite edges of the pixel may be reduced as comparedwith the case where the emission area has a rectangular shape, while thepixel area is the same as the case where the emission region has arectangular shape. In more detail, the light emitted from the organiclight-emitting diode OLED spreads in all directions. As the lightspreads in all directions, the light reaches the openings formed in thesecond insulating layer 140. In a comparative example, the openings mayhave a rectangular shape. That is, the openings may have a width in afirst direction (i.e., a Y direction) and a width in a second direction(i.e., an X direction) perpendicular to the first direction. Dependingon the widths of the openings, different amounts of light may passthrough the openings. The wider the openings, the greater the amount oflight passing through the openings. Therefore, when the width in thefirst direction is greater than the width in the second direction, theamount of light emitted in the second direction may be less than theamount of light emitted in the first direction. However, when theopenings formed in the second insulating layer 140 have a square shapelike in one embodiment of the present invention, the width in the firstdirection and the width in the second direction are the same. Therefore,the amount of light emitted in the second direction and the amount oflight emitted in the first direction are the same. Thus, reduction ofthe amount of light in a specific direction is prevented. Accordingly,it is possible to increase the amount of light passing through theopenings, and the area of the pixel may be the same as in the case whenthe openings have a rectangular shape. When the openings have arectangular shape, if the ratio of the vertical width to the horizontalwidth is 8:2, the area of the pixel is 16. As such, when the openingshave a square shape, the ratio of the vertical width to the horizontalwidth may be 4:4, and the area of the pixel becomes 16 like in the casewhere the openings have a rectangular shape.

When the first emission area EA1 of the first pixel P1, the secondemission area EA2 of the second pixel P2, and the third emission areaEA3 of the third pixel P3 have the square shapes, the first to thirdemission areas EA1, EA2, and EA3 may be disposed such that extensionlines connecting a center of one of the first to third emission areasEA1, EA2, and EA3 to centers of the other two emission areas may crossone another. As shown in FIG. 4, for example, a first extension line lconnecting the center of the second emission area EA2 to the center ofthe first emission area EA1 and a second extension line l′ connectingthe center of the second emission area EA2 to the center of the thirdemission area EA3 may cross each other.

FIG. 6 is a cross-sectional view of the first pixel P1 in the colorfilter unit CU according to an exemplary embodiment.

In detail, FIG. 6 shows a cross-section of the first pixel P1 takenalong line A-A′ of FIG. 4.

The light-blocking layer 130, the first filter layer 110R, the firstinsulating layer 150, the second insulating layer 140, and the firstcolor conversion layer 120R arranged in the first opening 141R andincluding the first quantum dots 121R (see FIG. 3) converting theincident light into first color light (e.g., the red light) may be onthe upper substrate 160.

The first opening portion 151R has a first extension portion 152Rextending in the first direction (i.e., +Y direction) and at leastpartially exposing the second insulating layer 140. In an exemplaryembodiment, the width W of the first extension portion 152R in the firstdirection (i.e., +Y direction) may be equal to or greater than twice awidth of the first opening 141R in the first direction (i.e., +Ydirection). However, the invention is not limited to the above example.

FIG. 6 shows the cross-section of the first pixel P1, but the secondpixel P2 and the third pixel P3 may have the same cross-sections as thatof the first pixel P1. However, as shown in FIG. 4, the second openingportion 151G of the second pixel P2 has a second extension portion 152Gextending in the second direction (i.e., −Y direction) and at leastpartially exposing the second insulating layer 140. In an exemplaryembodiment, the width of the second extension portion 152G in the seconddirection (−Y direction) may be equal to or greater than twice a widthof the second opening 141G in the second direction (−Y direction).However, the invention is not limited to the above example.

The first extension portion 152R, the second extension portion 152G, andthe third extension portion 152B may have the same width.

In an exemplary embodiment, a surface 170 of the second insulating layer140, where the surface 170 is exposed by the first extension portion152R, may be hydrophobic. The surface 170 that is hydrophobic may beobtained by performing a gas plasma process using a gas including ahalogen group element such as CF₄, SF₆, NF₃, etc. or a fluorine coating.Because the surface 170 of the second insulating layer 140 exposed bythe first extension portion 152R is hydrophobic, the first colorconversion layer 120R may be formed only in the first opening 141R in aprocess of manufacturing the first color conversion layer 120R. Theprocess will be described later.

FIG. 7 is a cross-sectional view of the color filter unit CU accordingto an exemplary embodiment.

FIG. 7 shows that the surface 170 of the second insulating layer 140,which is exposed by the first extension portion 152R, has an inclinationin the color filter unit CU according to the exemplary embodiment.

Referring to FIG. 7, the structure of the color filter unit CU is asdescribed above with reference to FIG. 6, and the surface 170 of thesecond insulating layer 140, which is exposed by the first extensionportion 152R, may have inclination. Referring to the enlarged view ofFIG. 7, a virtual line VS shown in the second insulating layer 140,where the virtual line VS extends from the first color conversion layer120R, is in parallel with the upper substrate 160. The virtual line VSand the surface of the second insulating layer 140 may have a certainangle 8 therebetween. The angle θ may be about 1° to 2°, and theinvention is not limited thereto.

According to the exemplary embodiments illustrated with reference toFIGS. 6 and 7, effect without loss in terms of the time (i.e., tacktime) taken for each manufacturing process may be achieved. In theexemplary embodiment, an inkjet printing method using nozzles may beused to form the first and second color conversion layers 120R and 120Gand the transmission layer 120B. As described above with reference toFIG. 4, the first to third emission areas EA1, EA2, and EA3 of the firstto third pixels P1, P2, and P3 may have square shapes. When the first tothird emission areas EA1, EA2, and EA3 have the square shapes, the firstto third filter layers 110R, 110G, and 1106, and the first and secondcolor conversion layers 120R and 120G and the transmission layer 120Bcorresponding to the first to third emission areas EA1, EA2, EA3 mayalso have the square shapes even though sizes of the shapes may bedifferent.

In a comparative example, different from the exemplary embodimentaccording to the invention, when the first extension portion 152R is notprovided, the first opening portion may have a square shape, and in thiscase, the number of nozzles arranged in a row may be restricted, whichmay result in increase of the tack time for each manufacturing processand degradation of production yield.

Therefore, in the display apparatus according to the exemplaryembodiment, the first opening portion 151R of the first insulating layer150 in the color filter unit CU includes the first extension portion152R, and when the surface 170 of the second insulating layer 140, wherethe surface 170 is exposed due to the first extension portion 152R, hashydrophobic property or inclination, a lot of nozzles arranged in a row(i.e., arranged in Y direction) may be used and thus effects withoutloss may be achieved in terms of the tack time for each manufacturingprocess.

Also, when the surface 170 of the second insulating layer 140, which isexposed by the first extension portion 152R, has the hydrophobicproperty or inclination, the ink sprayed through the nozzles may flowinto the first and second color conversion layers 120R and 120G, andthus, effect without loss may be achieved in terms of materials.

FIGS. 8 and 9 are cross-sectional views of the color filter unit CUaccording to another exemplary embodiment.

In detail, FIGS. 8 and 9 show a structure of the color filter unit CU,in which the first insulating layer and the second insulating layer areintegrally provided.

Referring to FIGS. 8 and 9, the first insulating layer 150 and thesecond insulating layer 140 may be integrated, different from FIGS. 6and 7 in which the first insulating layer 150 and the second insulatinglayer 140 are separated from each other. For example, the firstinsulating layer 150 and the second insulating layer 140 may besimultaneously manufactured through a same process using a half-tonemask.

The light-blocking layer 130, the first filter layer 110R, an integratedinsulating layer 180, and the first color conversion layer 120R providedin the first opening 141R may be disposed on the upper substrate 160.Here, the integrated insulating layer 180 includes a lower layer 180 bcorresponding to the second insulating layer 140 and an upper layer 180a corresponding to the first insulating layer 150. The first openingportion 151R may include the first extension portion 152R that extendsin the first direction (+Y direction) and at least partially exposes alower layer 180 b of the integrated insulating layer 180. In anexemplary embodiment, a width W of the first extension portion 152R inthe first direction (+Y direction) may be equal to or greater than twicea width of the first opening 141R in the first direction (+Y direction).However, the invention is not limited to the above example.

The first extension portion 152R, the second extension portion 152G, andthe third extension portion 152B may have the same width, but theinvention is not limited thereto.

FIG. 8 shows the same structure as that of FIG. 6 except that the firstinsulating layer 150 and the second insulating layer 140 are integrated,and thus, the surface 170 of the lower layer 180 b of the integratedinsulating layer 180 may have hydrophobic property, where the surface170 is exposed by the first extension portion 152R. The surface that ishydrophobic may be obtained by performing a gas plasma process using agas including a halogen group element such as CF₄, SF₆, NF₃, etc. or afluorine coating.

FIG. 9 shows the same structure as that of FIG. 7 except that the firstinsulating layer 150 and the second insulating layer 140 are integrated,and thus, the surface 170 of the lower layer 180 b of the integratedinsulating layer 180 may have inclination, where the surface 170 isexposed by the first extension portion 152R.

Also, the integrated insulating layer 180 may include a light-blockingmaterial.

FIG. 10 is a cross-sectional view of a display apparatus according to anexemplary embodiment.

Referring to FIG. 10, at least one thin film transistor T1 and a displaydevice connected to the thin film transistor T1 may be on the displayarea DA of the display apparatus according to the exemplary embodiment.

In the exemplary embodiment, the display area DA of the displayapparatus includes the plurality of first to third pixels P1, P2, andP3, and each of the first to third pixels P1, P2, and P3 includes anemission area EA. The emission area EA may be a region in which light isgenerated and emitted to the outside. The non-emission area NEA isbetween the emission areas EA, and the emission areas EA of the first tothird pixels P1, P2, and P3 may be partitioned by the non-emission areaNEA.

The first pixel P1, the second pixel P2, and the third pixel P3 may emitdifferent color light from one another. For example, the first pixel P1may emit red light, the second pixel P2 may emit green light, and thethird pixel P3 may emit blue light. In a plan view, the emission area EAof each pixel may have various polygonal shapes or circular shape, andthe emission areas EA may be arranged variously, e.g., stripearrangement, Pentile arrangement, etc.

In addition, the display apparatus according to the exemplary embodimentmay include the first and second color conversion layers 120R and 120Gand the transmission layer 120B corresponding to the emission areas EAof the first to third pixels P1, P2, and P3, respectively. The first andsecond color conversion layers 120R and 120G may include quantum dotsand metal nano-particles, and the transmission layer 120B may includemetal nano-particles.

For example, the first pixel P1 may include the first color conversionlayer 120R, the second pixel P2 may include the second color conversionlayer 120G, and the third pixel P3 may include the transmission layer120B.

In the exemplary embodiment, average sizes of the quantum dots includedin the first and second color conversion layers 120R and 120G may bedifferent from each other.

Hereinafter, the display apparatus of the exemplary embodiment will bedescribed in detail according to the stacked order in FIG. 10.

FIG. 10 shows a thin film transistor T1 and a storage capacitor Cst of apixel circuit in each pixel P in the display area DA. For example, thethin film transistor T1 may be a driving thin film transistor or aswitching thin film transistor. For convenience of description, elementsin the display area DA of FIG. 10 will be described according to astacking order.

The substrate 100 may include a glass material, a ceramic material, ametal material, or a flexible or bendable material. When the substrate100 is flexible or bendable, the substrate 100 may include a polymerresin such as a polyethersulfone, polyacrylate, polyetherimide,polyethylene naphthalate, polyethylene terephthalate, polyphynylenesulfide, polyarylate, polyimide, polycarbonate, or cellulose acetatepropionate. The substrate 100 may have a single-layered or amulti-layered structure of the above material, and the multi-layeredstructure may further include an inorganic layer. In an exemplaryembodiment, the substrate 100 may have a structure including an order oforganic material/inorganic material/organic material.

A barrier layer (not shown) may be further provided between thesubstrate 100 and a first buffer layer 111. The barrier layer mayprevent or reduce infiltration of impurities from the substrate 100,etc. into a semiconductor layer A1. The barrier layer may include aninorganic material such as an oxide material or a nitride material, anorganic material, or an inorganic-organic composite material, and mayhave a single-layered or multi-layered structure including the inorganicmaterial and the organic material.

A bias electrode BSM may be on the first buffer layer 111 to correspondto the thin film transistor T1. A voltage may be applied to the biaselectrode BSM. Also, the bias electrode BSM may prevent external lightfrom reaching the semiconductor layer A1. Accordingly, characteristicsof the thin film transistor T1 may be stabilized. The bias electrode BSMmay be omitted in some cases.

The semiconductor layer A1 may be on a second buffer layer 112. Thesemiconductor layer A1 may include amorphous silicon or polysilicon. Inanother exemplary embodiment, the semiconductor layer A1 may include anoxide of at least one selected from the group consisting of indium (In),gallium (Ga), stannum (Sn), zirconium (Zr), vanadium (V), hafnium (Hf),cadmium (Cd), germanium (Ge), chrome (Cr), titanium (Ti), aluminum (Al),cesium (Cs), cerium (Ce), and zinc (Zn). In some exemplary embodiments,the semiconductor layer A1 may include Zn oxide-based material, e.g., Znoxide, In—Zn oxide, Ga—In—Zn oxide, etc. In another exemplaryembodiment, the semiconductor layer A1 may include In—Ga—Zn—O (“IGZO”),In—Sn—Zn—O (“ITZO”), or In—Ga—Sn—Zn—O (“IGTZO”) semiconductor includingZnO with metal such as In, Ga, and Zn. The semiconductor layer A1 mayinclude a channel region and a source region and a drain region atopposite sides of the channel region. The semiconductor layer A1 mayhave a single-layered or multi-layered structure.

A gate electrode G1 is over the semiconductor layer A1 with a gateinsulating layer 113 therebetween, and the gate electrode G1 at leastpartially overlaps the semiconductor layer A1 in a plan view. The gateelectrode G1 may include molybdenum (Mo), aluminum (Al), copper (Cu),titanium (Ti), etc., and may have a single-layered or multi-layeredstructure. As an example, the gate electrode G1 may include a singlelayer including Mo. A first electrode CE1 of the capacitor Cst isdisposed at the same layer as the gate electrode G1. The first electrodeCE1 may include the same material as that of the gate electrode G1.

An interlayer insulating layer 115 may cover the gate electrode G1 andthe first electrode CE1 of the storage capacitor Cst. The interlayerinsulating layer 115 may include an insulating material such as siliconoxide (SiO₂), silicon nitride (SiN_(x)), silicon oxynitride (SiON),aluminum oxide (Al₂O₃), titanium oxide (TiO₂), tantalum oxide (Ta₂O₅),hafnium oxide (HfO₂), and zinc oxide (ZnO₂).

A second electrode CE2 of the storage capacitor Cst, a source electrodeS1, a drain electrode D1, and a data line (not shown) may be on theinterlayer insulating layer 115.

The second electrode CE2 of the storage capacitor Cst, the sourceelectrode S1, the drain electrode D1, and the data line may include aconductive material including molybdenum (Mo), aluminum (Al), copper(Cu), titanium (Ti), etc. and may have a single-layered or multi-layeredstructure including the above materials. In one exemplary embodiment,the second electrode CE2, the source electrode S1, the drain electrodeD1, and the data line has a multi-layered structure including an orderof Ti/Al/Ti. The source electrode S1 and the drain electrode D1 may beconnected to the source region or the drain region of the semiconductorlayer A1 via contact holes.

The second electrode CE2 of the storage capacitor Cst overlaps the firstelectrode CE1 with the interlayer insulating layer 115 therebetween andforms a capacitance in a plan view. In this case, the interlayerinsulating layer 115 may function as a dielectric layer of the storagecapacitor Cst.

The second electrode CE2 of the storage capacitor Cst, the sourceelectrode S1, the drain electrode D1, and the data line may be coveredby an inorganic protective layer PVX.

The inorganic protective layer PVX may have a single-layered ormulti-layered structure including silicon nitride (SiN_(x)) and siliconoxide (SiO_(x)). The inorganic protective layer PVX may be introduced tocover and protect some wirings on the interlayer insulating layer 115.In a partial area of the substrate 100 (e.g., a part of the peripheralarea), wirings (not shown) manufactured with the data line through thesame manufacturing process may be exposed. Exposed parts of the wiringsmay be damaged due to an etchant that is used in patterning of a pixelelectrode 310 that will be described later. However, since the inorganicprotective layer PVX according to the exemplary embodiment at leastpartially covers the data line and the wirings manufactured with thedata line, damage to the wirings during the patterning of the pixelelectrode 310 may be prevented.

A planarization layer 118 is on the inorganic protective layer PVX andthe organic light-emitting diode OLED may be on the planarization layer118.

The planarization layer 118 may include a single-layered ormulti-layered structure including an organic material, and may provide aplanarized upper surface. The planarization layer 118 may include ageneral universal polymer (benzocyclobutene (“BOB”), polyimide,hexamethyldisiloxane (“HMDSO”), polymethylmethacrylate (“PMMA”), orpolystyrene (“PS”)), polymer derivatives having phenol groups,acryl-based polymer, imide-based polymer, aryl ether-based polymer,amide-based polymer, fluoride-based polymer, p-xylene-based polymer,vinyl alcohol-based polymer, and blends thereof.

In the display area DA of the substrate 100, the organic light-emittingdiode OLED is on the planarization layer 118. The organic light-emittingdiode OLED includes the pixel electrode 310, an intermediate layer 320including an organic light-emitting layer, and an opposite electrode330.

The pixel electrode 310 may be a (semi-)transmissive electrode or areflective electrode. In some exemplary embodiments, the pixel electrode310 may include a reflective layer including Ag, Mg, Al, Pt, Pd, Au, Ni,Nd, Ir, Cr, or a compound thereof, and a transparent or semi-transparentelectrode layer disposed on the reflective layer. The transparent orsemi-transparent electrode layer may include at least one selected fromthe group consisting of indium tin oxide (“ITO”), indium zinc oxide(“IZO”), zinc oxide (“ZnO”), indium oxide (“In₂O₃”), indium galliumoxide, and aluminum zinc oxide (“AZO”). In some exemplary embodiments,the pixel electrode 310 may include an order of ITO/Ag/ITO.

A pixel defining layer 119 may be on the planarization layer 118. Also,the pixel defining layer 119 increases a distance between an edge of thepixel electrode 310 and the opposite electrode 330 on the pixelelectrode 310 to prevent generation of arc at the edge of the pixelelectrode 310.

The pixel defining layer 119 may include one or more organic insulatingmaterials selected from the group consisting of polyimide, polyamide,acryl resin, BCB, and phenol resin, and may be manufactured by a spincoating method, etc.

The intermediate layer 320 of the organic light-emitting diode OLED mayinclude an organic light-emitting layer. The organic light-emittinglayer may include an organic material including a fluorescent orphosphor material emitting red, green, blue, or white light. The organiclight-emitting layer may include a low-molecular organic material or apolymer organic material, and functional layers such as a hole transportlayer (“HTL”), a hole injection layer (“HIL”), an electron transportlayer (“ETL”), and an electron injection layer (“EIL”) may beselectively arranged under and on the organic light-emitting layer. Theintermediate layer 320 may be provided as a several pieces such thateach piece corresponds to each of a plurality of pixel electrodes 310.However, the invention is not limited thereto. The intermediate layer320 may be variously modified, that is, may be provided as monolithic tocover the plurality of pixel electrodes 310.

In the drawings, the intermediate layer 320 is provided for each of thefirst to third pixels P1, P2, and P3, but the invention is not limitedthereto. The intermediate layer 320 may be integrally formed asmonolithic with respect to the first to third pixels P1, P2, and P3.

In the exemplary embodiment, the organic light-emitting diodes OLEDincluded in the first to third pixels P1, P2, and P3 may include theorganic light-emitting layers emitting the same color light. Forexample, the organic light-emitting diodes OLED included in the first tothird pixels P1, P2, and P3 may all emit blue light.

The opposite electrode 330 may be a transmissive electrode or areflective electrode. In some exemplary embodiments, the oppositeelectrode 330 may be a transparent or a semi-transparent electrode, andmay be provided as a metal thin film including Li, Ca, LiF/Ca, LiF/AI,Al, Ag, Mg, or a compound thereof having a small work function. Also, atransparent conductive oxide (“TCO”) layer such as ITO, IZO, ZnO, orIn₂O₃ may be further provided over the metal thin film. The oppositeelectrode 330 is arranged throughout the display area DA and aperipheral area PA, and on the intermediate layer 320 and the pixeldefining layer 119. The opposite electrode 330 may be providedintegrally with respect to the plurality of organic light-emittingdiodes OLED to correspond to the plurality of pixel electrodes 310.

A spacer 119S may be further provided on the pixel defining layer 119for preventing a mask dent. The spacer 119S may be integrallymanufactured with the pixel defining layer 119. For example, the spacer119S and the pixel defining layer 119 may be manufactured simultaneouslyin the same process by using a halftone mask process.

Because the organic light-emitting diode OLED is easily damaged byexternal moisture or oxygen, the organic light-emitting diode OLED maybe covered and protected by a thin film encapsulation layer 400. Thethin film encapsulation layer 400 covers the display area DA and mayextend to the outside of the display area DA. The thin filmencapsulation layer 400 includes at least one organic encapsulationlayer and at least one inorganic encapsulation layer. For example, thethin film encapsulation layer 400 may include a first inorganicencapsulation layer 410, an organic encapsulation layer 420, and asecond inorganic encapsulation layer 430.

The first inorganic encapsulation layer 410 covers the oppositeelectrode 330 and may include silicon oxide, silicon nitride, and/orsilicon trioxynitride. Although not shown in the drawings, other layerssuch as a capping layer may be provided between the first inorganicencapsulation layer 410 and the opposite electrode 330, if necessary.Since the first inorganic encapsulation layer 410 is formed along astructure thereunder, the first inorganic encapsulation layer 410 has anuneven upper surface. The organic encapsulation layer 420 covers thefirst inorganic encapsulation layer 410, and unlike the first inorganicencapsulation layer 410, the organic encapsulation layer 420 may have aflat upper surface. In detail, the organic encapsulation layer 420 mayplanarize the upper surface of a portion corresponding to the displayarea DA. The organic encapsulation layer 420 may include one or morematerials selected from the group consisting of polyethyleneterephthalate, polyethylene naphthalate, polycarbonate, polyimide,polyethylene sulfonate, polyoxymethylene, polyarylate, and hexamethyldisiloxane. The second inorganic encapsulation layer 430 may cover theorganic encapsulation layer 420, and may include silicon oxide, siliconnitride, and/or silicon trioxynitride.

Even when cracks occur in the thin film encapsulation layer 400, thecracks may be disconnected between the first inorganic encapsulationlayer 410 and the organic encapsulation layer 420 or between the organicencapsulation layer 420 and the second inorganic encapsulation layer 430owing to the multi-layered structure in the thin film encapsulationlayer 400. As such, generation of an infiltration path through which theexternal moisture or oxygen passes to the display area DA may beprevented or reduced.

In the exemplary embodiment, the first and second color conversionlayers 120R and 120G and the transmission layer 120B may be on the uppersubstrate 160 facing the substrate 100.

The display device has been described, but the disclosure is not limitedthereto. For example, a method of manufacturing the display device maybe also included in the scope of the disclosure.

FIGS. 11A to 11F are cross-sectional views illustrating processes in amethod of manufacturing a display apparatus, according to an exemplaryembodiment.

FIGS. 11A to 11E illustrate processes of forming the color filter unitCU with reference to FIG. 6. In FIGS. 11A to 11E, for convenience ofdescription, it is described that various layers are stacked on theupper substrate 160 in a +Z direction, but the completely made colorfilter unit CU according to the exemplary embodiment may be turnedupside down to be attached to the display unit DU as shown in FIG. 11F.Therefore, the layers will be described in a stacked order on the uppersubstrate 160. FIGS. 11A to 11E illustrate manufacturing processes basedon the first pixel P1, but the second pixel P2 and the third pixel P3may be also manufactured through the same manufacturing processes withthose of the first pixel P1.

FIG. 11A is a cross-sectional view showing a state in which thelight-blocking layer 130 and the first filter layer 110R are formed onthe upper substrate 160.

Referring to FIG. 11A, the light-blocking layer 130 and the first filterlayer 110R may be formed on the upper substrate 160. In an exemplaryembodiment, the light-blocking layer 130 defining a hole is formed andthe first filter layer 110R is formed in the hole of the light-blockinglayer 130. The upper substrate 160 may include a glass material, aceramic material, a metal material, or a flexible or bendable material.In addition, the upper substrate 160 may have a single-layered ormulti-layered structure including the above-stated materials.

The light-blocking layer 130 may be among the first to third filterlayers 110R, 110G, and 110B to correspond to the non-emitting area NEA.The light-blocking layer 130 may include a black matrix and may improvecolor sharpness and contrast. The light-blocking layer 130 may includeat least one selected from black pigment, black dye, and blackparticles. In some exemplary embodiments, the light-blocking layer 130may include a material such as Cr or CrO_(X), Cr/CrO_(X),Cr/CrO_(X)/CrN_(Y), a resin (e.g., carbon pigment, RGB mixture pigment),graphite, non-Cr based material, etc.

Different from FIG. 11A, there may be a height difference between anupper surface 130 a of the light-blocking layer 130 and an upper surface110Ra of the first filter layer 110R in another exemplary embodiment.For example, a height of the upper surface 110Ra of the first filterlayer 110R may be greater than that of the upper surface 130 a of thelight-blocking layer 130, or the upper surface 110Ra and the uppersurface 130 a may overlap each other.

FIG. 11B is a cross-sectional view showing a state after the secondinsulating layer 140 is formed on the light-blocking layer 130 of FIG.11A.

Referring to FIG. 11B, a width W1 of the first opening 141R in the firstdirection (i.e., +Y direction) may be greater than a width WO of thefirst filter layer 110R in the first direction (i.e., +Y direction).

In addition, the second insulating layer 140 may include alight-blocking material. The light-blocking material may include, forexample, at least one selected from black pigment, black dye, blackparticles, and metal particles.

FIG. 11C is a cross-sectional view showing a state after the firstinsulating layer 150 is formed on the second insulating layer 140 ofFIG. 11B and the surface 170 of the second insulating layer 140 exposedby the first extension portion 152R is formed to have hydrophobicproperty.

Referring to FIG. 11C, a width W2 of the first opening portion 151R inthe first direction (i.e., +Y direction) may be greater than the widthW1 of the first opening 141R in the first direction (i.e., +Ydirection).

The surface 170 of the second insulating layer 140, where the surface170 is exposed by the first extension portion 152R, may be formed by agas plasma process using a gas including a halogen group element such asCF₄, SF₆, NF₃, etc. or by a fluorine coating. Remaining surface of thesecond insulating layer 140, which is exposed due to a differencebetween the first opening portion 151R and the first opening 141 R, mayalso have the hydrophobic property.

FIG. 11C shows an example in which the surface 170 of the secondinsulating layer 140 exposed by the first extension portion 152R has thehydrophobic property, and thus, the surface 170 may be inclined as shownin FIG. 7. Also, as shown in FIGS. 8 and 9, the first insulating layer150 and the second insulating layer 140 may be integrated with eachother. For example, the first insulating layer 150 and the secondinsulating layer 140 may be simultaneously manufactured through a sameprocess using a half-tone mask.

FIG. 11D is a cross-sectional view showing a state in which the firstcolor conversion layer 120R is formed by using a nozzle N in the firstopening 141R defined in the second insulating layer 140.

Due to the surface having the hydrophobic property formed in FIG. 11C,the ink sprayed from the nozzle N does not stay on the surface 170 ofthe second insulating layer 140, which is exposed by the first extensionportion 152R, but flows into the first opening 141R, as shown in FIG.11D. However, the invention is not limited thereto, that is, asdescribed above, besides the surface having the hydrophobic property,other various ways, e.g., an inclined surface, etc. may be used.

FIG. 11E is a cross-sectional view showing a state after forming thefirst color conversion layer 120R, and FIG. 11F is a cross-sectionalview showing a state in which the color filter unit CU formed throughthe processes shown in FIGS. 11A to 11E is bonded to the display unitDU.

A filler 500 may be further provided between the substrate 100 and theupper substrate 160. The filler 500 may buffer external pressure, etc.The filler 500 may include an organic material such as methyl silicone,phenyl silicone, polyimide, etc. However, one or more exemplaryembodiments are not limited thereto, and the filler 500 may include anorganic sealant such as a urethane-based resin, or an epoxy-based resin,an acryl-based resin, or an inorganic sealant such as silicone.

In the display apparatus according to the exemplary embodiment, thefirst opening portion 151R of the first insulating layer 150 in thecolor filter unit CU includes the first extension portion 152R, and whenthe surface 170 of the second insulating layer 140, where the surface170 is exposed due to the first extension portion 152R, has hydrophobicproperty or inclination, a lot of nozzles arranged in a row (arranged inY direction) may be used and thus effects without loss may be achievedin terms of the tack time for each manufacturing process.

Also, when the surface 170 of the second insulating layer 140, which isexposed by the first extension portion 152R, has the hydrophobicproperty or inclination, the ink sprayed through the nozzles may flowinto the first and second color conversion layers 120R and 120G, andthus, effect without loss may be achieved in terms of materials.

According to the exemplary embodiments above, the display apparatushaving no loss in view of the time (i.e., tack time) for eachmanufacturing process and the method of manufacturing the displayapparatus may be implemented. However, the scope of the disclosure isnot limited to the above effects.

It should be understood that exemplary embodiments described hereinshould be considered in a descriptive sense only and not for purposes oflimitation. Descriptions of features or aspects within each exemplaryembodiment should typically be considered as available for other similarfeatures or aspects in other exemplary embodiments. While one or moreexemplary embodiments have been described with reference to the figures,it will be understood by those of ordinary skill in the art that variouschanges in form and details may be made therein without departing fromthe spirit and scope as defined by the following claims.

What is claimed is:
 1. A display apparatus, comprising: a first pixel, asecond pixel, and a third pixel which emit light of different colorsfrom one another; a first insulating layer on a first display element ofthe first pixel, the first insulating layer defining a first openingportion corresponding to the first display element; a second insulatinglayer on the first insulating layer, the second insulating layerdefining a first opening corresponding to the first opening portion; afirst color conversion layer disposed in the first opening, the firstcolor conversion layer comprising first quantum dots for convertingincident light into first color light; and a first filter layer on thefirst color conversion layer, wherein the first opening portion has afirst extension portion which extends in a first direction and at leastpartially exposes the second insulating layer.
 2. The display apparatusof claim 1, further comprising: a second color conversion layer whichcorresponds to a second display element of the second pixel, the secondcolor conversion layer comprising second quantum dots for converting theincident light into second color light; and a second filter layer on thesecond color conversion layer, wherein the first insulating layerfurther defines a second opening portion corresponding to the seconddisplay element of the second pixel, the second insulating layer furtherdefines a second opening corresponding to the second opening portion,the second color conversion layer is located in the second opening, andthe second opening portion comprises a second extension portion whichextends in a second direction opposite to the first direction and atleast partially exposes the second insulating layer.
 3. The displayapparatus of claim 2, further comprising: a transmission layer whichcorresponds to a third display element of the third pixel, thetransmission layer comprising scattering particles for scattering theincident light; and a third filter layer on the transmission layer,wherein the first insulating layer further defines a third openingportion corresponding to the third display element of the third pixel,the second insulating layer further defines a third openingcorresponding to the third opening portion, the transmission layer islocated in the third opening, and the third opening portion comprises athird extension portion which extends in the first direction and atleast partially exposes the second insulating layer.
 4. The displayapparatus of claim 3, wherein the first extension portion, the secondextension portion, and the third extension portion have a same width inthe first direction or the second direction.
 5. The display apparatus ofclaim 1, wherein a first emission area of the first pixel, a secondemission area of the second pixel, and a third emission area of thethird pixel have square shapes in a plan view.
 6. The display apparatusof claim 5, wherein extension lines which connect a center of one of thefirst emission area, the second emission area, and the third emissionarea to centers of the other two emission areas cross one another in theplan view.
 7. The display apparatus of claim 1, wherein at least one ofthe first insulating layer and the second insulating layer includes alight-blocking material.
 8. The display apparatus of claim 1, wherein asurface of the second insulating layer, which is exposed by the firstextension portion, has a hydrophobic property.
 9. The display apparatusof claim 1, wherein a surface of the second insulating layer, which isexposed by the first extension portion, is inclined.
 10. The displayapparatus of claim 1, wherein the first insulating layer and the secondinsulating layer are integrally provided with each other.
 11. Thedisplay apparatus of claim 10, wherein a surface of the secondinsulating layer, which is exposed by the first extension portion, has ahydrophobic property.
 12. The display apparatus of claim 10, wherein asurface of the second insulating layer, which is exposed by the firstextension portion, is inclined.
 13. A method of manufacturing a displayapparatus, the method comprising: manufacturing a display unit;manufacturing a color filter unit; and bonding the display unit to thecolor filter unit, wherein the manufacturing of the color filter unitcomprises: forming a light-blocking layer on an upper substrate; forminga first filter layer in a hole defined by the light-blocking layer;forming a second insulating layer defining a first opening on thelight-blocking layers; forming a first insulating layer defining a firstopening portion on the second insulating layer, wherein the firstopening portion has a first extension portion which extends in a firstdirection and at least partially exposes the second insulating layer;and forming a first color conversion layer in the first opening, thefirst color conversion layer comprising first quantum dots forconverting incident light into first color light.
 14. The method ofclaim 13, further comprising: processing a surface of the secondinsulating layer to have a hydrophobic property, wherein the surface isexposed by the first extension portion.
 15. The method of claim 13,further comprising: processing a surface of the second insulating layerto be inclined, wherein the surface is exposed by the first extensionportion.
 16. The method of claim 13, wherein the forming of the firstinsulating layer and the forming of the second insulating layer areperformed simultaneously.
 17. The method of claim 16, wherein theforming of the first insulating layer and the forming of the secondinsulating layer are performed by using a half-tone mask.
 18. The methodof claim 16, further comprising: processing a surface of the secondinsulating layer to have a hydrophobic property, wherein the surface isexposed by the first extension portion.
 19. The method of claim 13,wherein the forming of the first color conversion layer is performed byan inkjet printing method.
 20. The method of claim 13, wherein at leastone of the first insulating layer and the second insulating layerincludes a light-blocking material.